Many processes in semiconductor manufacturing are carried out in very high temperature and very corrosive environment, the process must be operated in a high temperature clean and dust-free environment, high purity ultra-fine high strength isostatic graphite has high temperature resistance, excellent thermal conductivity, good thermal vibration resistance, low coefficient of thermal expansion, high bending and compressive strength, stable chemical properties, etc. A key material in semiconductor manufacturing. Used in semiconductor crystal growth, epitaxial growth, vapor deposition silicon carbide, ion implantation, plasma etching and other manufacturing processes, its main applications are as follows:

① Heating body, crucible, flow tube, etc., of monocrystalline silicon crystal drawing furnace

② The third generation of semiconductor SiC crystal growth furnace heating body

③ Graphite base in MOCVD

④ Silicon epitaxial base in EPI process